Our non-woven cloths are suitbale for finishing and are primarily used with conventional polishing media. Acceptable flatness rates can be achieved with low abrasion. The non-woven cloths are especially suitable for applications in semi conductor technics and with medium hard to hard materials.
Dimensions:
Diameter:
Thickness:
Hardness:
up to 1200 mm
0,49-1,75 mm
not defined
Abrasive
Characteristics
für conventional and mechanochemical polishing medium:
diamond, boron carbide, alumina, silica
Thickness 1,75 mm
Non-Woven
very resistable
nice shine and glance effect on machined materials
Low removal ratio
Abrasive
Characteristics
conventional polishing medium
Thickness 0,49 mm
Non-Woven with thin structure in grit shape
thermally toughened fibers and resin coating
elektronic materials and semi-conductors with large dimensions
Abrasive
Characteristics
all types
Thickness 1,20 mm
Non-Woven, made of fibers strongly saturated with soft resin
less permeable
strongly ettable
Abrasive
Characteristics
all types
Thickness 1,05 mm
Non-Woven
developed for precise polishing
very high lifetime du to significant thickness of active fibers (0,8 mm)
good for grinding or cutting materials
Abrasive
Characteristics
Silica
Thickness 1,70 mm
Non-Woven,inflexible, thick and very resistable
significant stock removal
especially suitable for semi-conductor, monocrystals, wafers, quartz, sapphire and any materials that can be polished with silica
Our non-woven cloths are suitbale for finishing and are primarily used with conventional polishing media. Acceptable flatness rates can be achieved with low abrasion. The non-woven cloths are especially suitable for applications in semi conductor technics and with medium hard to hard materials.
design: kreative-medien.de