Polyurethane felt compound (FPU)

The polishing cloths of the FPU series consist of a polyurethan felt compound.

The FPU series stand out due to their high abrasion and the high surface quality with medium flatness. They have a long life time and ensure a fast achievement of the needed requirements, but with limited brushing and conditioning capabilities.

The FPU series is especially suitable for glass, plastics and semi conductor, but also for stainless steel, non-ferrous metal or silver.

Dimensions: Diameter: Thickness: Hardness:	up to 1300 mm (larger sizes on request) 1,3-25 mm 35-85 Shore-C

	Abrasives	Characteristics
	all types	Application: quartz, silicon wafer, cadmium telluride, gallium, arsenide, silicon carbide, stainless steel and sapphire Hardness: 60 Shore-C Pressure (%): 4-6 % (250g force displacement) : 0,42 g/cm³ Thickness: 0,050“, 0,090“ und 0,150“

	Abrasives	Characteristics
	Zirconium oxide	Application: when high flatness is required Hardness: 84 Shore-C Density: 0,83 g/cm³ Thickness: 0,020“

	Abrasives	Characteristics
	Diamond fluid, mechanochemical polishing medium	Application: hardened glass, crystals, sapphire Hardness: 85 Shore-C Pressure (%): 1-3 % (250g force displacement) Density: 0,85 g/cm³ Thickness: 0,045“

	Abrasives	Characteristics
	conventional polishing medium	Application: weiches synthetisches Glas, Polycarbonat Hardness: 35 Shore-C Pressure (%): 5-7 % (2 kg force displacement) Density: 0,35 g/cm³ Thickness: 0,125“ und 0,275“

	Abrasives	Characteristics
	conventional polishing medium	Application: silicon wafer, cadmium telluride, gallium arsenide, stainless steel, glass, ceramics, sapphire, quartz glass Hardness: 55-60 Shore-C Pressure (%): 3-5 % (250g force displacement) Density: 0,46 g/cm³ Thickness: 0,050“ und 0,150“

	Abrasives	Characteristics
	conventional polishing medium	Application: hard glass, crystals, ceramic seals and sapphire Hardness: 65 Shore-C Pressure (%): 3-5 % (250g force displacement) Density: 0,54 g/cm³ Thickness: 0,050“ und 0,150“

	Abrasives	Characteristics
	conventional polishing medium	Application: small devices with low or medium pressure; for fragile / sensitive workpieces Hardness: 40 Shore-C Pressure (%): 5-7 % (2 kg force displacement) Density: 0,34 g/cm³ Thickness: 0,090“, 0,125“, 0,150“, 0,180“ und 0,250“

	Abrasives	Characteristics
	conventional polishing medium	Application: small device witth low or medium pressure, crystals, medium hard glass, quartz, stainless steel Hardness: 40-50 Shore-C Pressure (%): 2-5 % (2 kg force displacement) Density: 0,33 - 0,37 g/cm³ Thickness: 0,050“, 0,090“ und 0,150“

design: kreative-medien.de